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Analysis of Organic Contaminants in Cleanroom Air and on Silicon Wafer Surface

机译:洁净室空气和硅晶片表面的有机污染物分析

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Concentrations of organic contaminants (hereafter abbreviated as ORCs)in cleanroom air were measured regularly since operations in a new cleanroom were started. Concentrations of ORCs in cleanroom air gradually decreased and attained steady state values after six months. The removal efficiency of a chemical filter for total ORCs was significantly reduced with time, however the efficiencies for di(2-ethylhexyl)phthalate (DOP), di(isobutyl) phthalate and low molecar weight cyclosiloxanes (LMCSs) remained at a sufficiently high value for three years. The sticking probabilities of DOP and Trichloroethylphosphate onto Si surface were estimated to be 1X10~(-2) and 5X10~(-3) from the concentrations of ORCs in the air and the masses of ORCs deposited on Si wafers.
机译:自开始在新的洁净室中运行以来,定期测量洁净室空气中有机污染物(以下简称为ORC)的浓度。六个月后,洁净室空气中的ORC浓度逐渐降低并达到稳态值。随着时间的推移,化学过滤器对总ORC的去除效率会显着降低,但是邻苯二甲酸二(2-乙基己基)酯(DOP),邻苯二甲酸二(异丁基)酯和低分子量的环硅氧烷(LMCS)的效率仍保持在足够高的水平三年来。根据空气中ORC的浓度和沉积在硅片上的ORC的质量,DOP和磷酸三氯乙基磷酸酯在Si表面的粘附概率估计为1X10〜(-2)和5X10〜(-3)。

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