Surface decontamination apparatus, especially for organic contaminant removal from a structured silicon wafer or body, comprises an ozone reactor in which a structured body is heated during ozone exposure

摘要

A structured body surface decontamination apparatus, comprising an ozone reactor (5) in which the body (20) is heated during exposure to an ozone-containing gas, is new, An Independent claim is also included for a method of eliminating especially organic contaminants from a structured body (20) using the above apparatus. Preferred Features: The ozone-containing gas comprises oxygen or air containing 1-30 vol.% ozone and the body surface is heated to 150-435 (especially 200-350) deg C.