...
首页> 外文期刊>表面科学 >High Performance Polishing Method -Mechanochemical Polishing by Soft Abrasives-
【24h】

High Performance Polishing Method -Mechanochemical Polishing by Soft Abrasives-

机译:高性能抛光方法-用软磨料进行机械化学抛光-

获取原文
获取原文并翻译 | 示例
           

摘要

The principle of mechanochemical polishing and examples of the method are described. By using the method we can polish hard and functional materials with the abrasive powders that are mechanically softer than the materials. If the powders supplied are chemically reactive with the materials to poloshed, mechanochemical reactions take place at the real contact points. Applications of this method to sapphire, silicon wafer, quartz and silican carbide are shown.
机译:描述了机械化学抛光的原理和方法实例。通过使用该方法,我们可以使用机械上比材料软的磨料粉抛光坚硬的功能材料。如果所提供的粉末与材料发生化学反应而产生球团,则机械化学反应会在实际接触点发生。示出了该方法在蓝宝石,硅晶片,石英和碳化硅中的应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号