Simultaneous removal for gaseous and particulate contaminants by a UV/photoelectron method -super-cleaning of mini-environments-

摘要

A feasibility study was made on a UV/photoelectron method for simultaneous removal of gaseous contaminants and particulate matter in a cleanroom. The study revealed that this method, which uses a photocatalyst, was capable of creating asuper-clean space, preventing contamination on the surfaces of metallic and non-metallic substrates, fitted on devices inside a super-clean space. Measurement on time-dependent dielectric breakdown (TDDB) characteristics of an actual electron device (MOScapacitator) revealed that there was an improvement in the reliability of gate oxide layers.