Electron beam lithography is a quick and perfect solution for the fabrication of small amount of prototype nano-scaled structures where frequently changes in design are necessary and the conventional photolithography with optical masks is found ineffective. Although a simply constructed scanning-electron-microscope (SEM)-based e-beam writer can not be on a par with the commercially available multi-million-dollar e-beam writers, it offers a cost-effective solution for the research and development laboratories. In this article we briefly introduce the e-beam lithography techniques, and we describe our experiences in the modification of an SEM into an e-beam writer.
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