Low Temperatures Process of Inductively Coupled Plasma-Enhanced Atomic Layer Deposition for Fabricating Platinum Nano Thin Films as Photocatalyst

摘要

The inductively coupled plasma-enhanced atomic layer deposition (PEALD) method was used to fabricate nano Pt thin films at low temperatures with good thermal and chemical stability. The Pt thin metal films deposited on circular glass disk by PEALD can be used as reaction disk in the photocatalytic spinning disk reactor. The deposited Pt thin film has clear 4f peaks (74.3 eV (4f5/2) and 71.1 eV (4f7/2)) in X-ray photoelectron spectra measurements. The X-ray diffraction measurements showed the (111) peak of the fee structure. The deposited Pt thin film has electric sheet resistance smaller than 12μΩ cm for films with a thickness greater than 8 nm. The PEALD-deposited Pt thin films were chemically stable under high-temperature light illumination and could serve as catalysts under strongly alkaline conditions (pH =12) during the long-term oxidization of ammonium ions.