ANALYSIS OF FABRICATION TOLERANCE BASED ON UNEVEN THICKNESS OF S118-PHOTO-RESIST

摘要

In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h ∈[0,3μm] and a, b ∈ [0,2μm], light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.