Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

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Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

机译：基于Su8光刻胶厚度不均的制造公差分析

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Inthispaper,wehaveanalyzedtherelationshipbetweenlightpropagationperformanceanduneventhicknessofSu8-photo-resistbasedonEOPCB.AlthoughspinningprocessisusedtoeventheSu8-photo-resist,theobtainedSu8-photo-resistisuneven,whichdirectlyaffectcross-sectionshapeofcorelayer.Aslongaswecontroland,lightpropagationperformancedoesnotaffected.But,itiseasytoactuallyfabricateEOPCB.

机译：本文分析了基于EOPCB的Su8光敏抗蚀剂的光传播性能与厚度不均之间的关系。尽管对Su8光敏抗蚀剂使用了纺丝工艺，但获得的Su8光敏抗蚀剂均不均匀，这直接影响了PCB的横截面形状。

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《Optoelectronics and Advanced Materials-Rapid Communications》 |2012年第2012期|共页
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Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

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