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首页> 外文期刊>Computational Materials Science >Insight into the effect of surface structure on H-2 adsorption and activation over different CuO(111) surfaces: A first-principle study
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Insight into the effect of surface structure on H-2 adsorption and activation over different CuO(111) surfaces: A first-principle study

机译:深入了解表面结构对H-2在不同CuO(111)表面上的吸附和活化的影响:第一性原理研究

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摘要

Using density functional theory (DFT) calculations, the interactions of H and H-2 with different types of CuO(111) surfaces, including the perfect, oxygen-vacancy and pre-covered oxygen surfaces, have been systematically investigated to probe into the effect of surface structures on H-2 adsorption and activation. Our results show that the outermost surface oxygen site (O-SUF) is the active center for H adsorption both on the perfect and oxygen-vacancy surfaces, while H favorably adsorbs at the pre-covered oxygen site (O-pre) on the pre-covered oxygen CuO(111) surface. In the case of H-2 adsorption and activation, H-2 is the dissociative adsorption on the perfect surface, two dissociative H atoms adsorbed at the same OSUF site pull out the OSUF atom from the surface to form a H2O molecule adsorbed at the subsurface copper site (Cu-SUB), which ultimately contributes to the formation of oxygen-vacancy site on CuO(111) surface. For the oxygen-vacancy surface, H-2 adsorbed at the singly (Cu-1) and doubly (Cu-2) coordinated CuSUB sites via the side-on mode are two favorable configurations, moreover, the dissociation barriers for these two favorable configurations is higher than their corresponding adsorption energies, namely, H-2 dissociation is difficult to occur on the oxygen-vacancy surface. For the pre-covered oxygen surface, H-2 initially adsorbed at OSUF site with the side-on or end-on modes is the dissociative adsorption, in which one H is still adsorbed at OSUF site, the other H is adsorbed at the adjacent pre-covered oxygen site; meanwhile, H-2 initially adsorbed at Opre site with the side-on mode is also the dissociative adsorption. Thus, H-2 dominantly exists in the form of the dissociative adsorption with the adsorbed H atoms on the perfect and pre-covered oxygen surfaces, whereas, H-2 mainly exists in the form of molecular adsorption H-2 on the oxygen-vacancy surface, suggesting that the adsorption and activation behaviors of H-2 over CuO(111) surface are particularly sensitive to the surface structure. (C) 2016 Elsevier B.V. All rights reserved.
机译:使用密度泛函理论(DFT)计算,已系统地研究了H和H-2与不同类型的CuO(111)表面(包括完美的,氧空位和预先覆盖的氧表面)之间的相互作用,以探究其作用表面结构对H-2吸附和活化的影响我们的结果表明,最外面的表面氧位点(O-SUF)是H在理想表面和氧空位表面上吸附的活性中心,而H则有利地吸附在预表面上的预覆盖氧位点(O-pre)上。覆盖的氧CuO(111)表面。在H-2吸附和活化的情况下,H-2是在理想表面上的离解性吸附,在相同OSUF位置处吸附的两个离解性H原子从表面拉出OSUF原子,从而形成在地下吸附的H2O分子铜位点(Cu-SUB),最终有助于在CuO(111)表面上形成氧空位。对于氧空位表面,通过侧开模式吸附在单(Cu-1)和双(Cu-2)配位的CuSUB位点上的H-2是两个有利构型,此外,这两个有利构型的离解势垒当H 2-解氢比它们相应的吸附能高时,即H 2的解离很难在氧空位表面上发生。对于预先覆盖的氧气表面,最初以侧向或末端模式吸附在OSUF部位的H-2是离解吸附,其中一个H仍吸附在OSUF部位,另一个H吸附在相邻的OUF处。预先覆盖的氧气位;同时,最初以侧向模式吸附在Opre部位的H-2也是解离吸附。因此,H-2主要以离解吸附的形式与被吸附的氢原子在理想的和预先覆盖的氧表面上存在,而H-2主要以分子吸附的H-2形式存在于氧空位上表面,表明H-2在CuO(111)表面上的吸附和活化行为对表面结构特别敏感。 (C)2016 Elsevier B.V.保留所有权利。

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