Grating Fabrication Techniques in Moire Methodology for Displacement and Strain Measurement

摘要

Several commonly used grating fabrication techniques for displacement and strain measurement are overviewed. The fabrication processes of electron beam lithography, focused ion beam milling, nanoimprint lithography and grating duplication are presented for the micron/submicron scale grating fabrication. The techniques using laser or inkjet printing, mechanical or rubber stamping, laser marking, and the template method are shown to produce the millimeter scale gratings. Some typical grating morphologies at the micron/submicron and the millimeter scales are illustrated. The features of these grating fabrication techniques are summarized and compared from various viewpoints. The considerations in grating design for acquiring distinct moire fringes for deformation measurement in moire methodology are discussed. This work is expected to provide enlightenment for grating generation on specimens and facilitate deformation distribution measurement using optical methods.