Equipment for Chemical Etching and Polishing of the Plate Surfaces

摘要

Various sets for chemical etching and chemical dynamic polishing of the plate surface are considered in the context of various problems of the material science. The sets presented provide the laminar hydrodynamic regimen of the liquid phase agitation in combination with rotation of polishing plates around their axis, thus forming conditions of equally accessible reaction sample surface. The results of experimental testing of the sets developed are presented.