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Comprehension of the S(V)LS mechanism growth of silicon-based nanowires

机译:硅基纳米线的S(V)LS机制生长的理解

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A comprehensive thermodynamic assessment has been carried out on the Au-Si-O system involved in the growth mechanism of Silicon NanoWires (SiNW) via the solid-liquid-solid process.The driving force needed to trigger the SiNW precipitation is supersaturation of liquid alloy Au-Si.Our model demonstrates,for the first time,how and from where supersaturation is reached.Supersaturation is not due to the migration of silicon from the wafer as claimed by many researchers,but to the existence of SiO volatile species resulting from the metastable equilibrium SiO_(2,amorphous)/Si_(wafer).More interesting is that the partial pressure P_(sio) does impose an initial minimum radius of the first generation of nanowires in the range of 10 nm.After that,other generations of nanowires will grow due to the new metastable equilibrium SiO_(2,amorphous)/Si_(nanowire).
机译:通过固液固过程对参与硅纳米线(SiNW)生长机理的Au-Si-O体系进行了全面的热力学评估。触发SiNW沉淀所需的驱动力是液态合金的过饱和Au-Si。我们的模型首次展示了达到过饱和的方式和来源。过饱和不是像许多研究人员所声称的那样,是由于硅从晶圆中迁移所致,而是由于硅的挥发性物质的存在。亚稳态平衡SiO_(2,amorphous)/ Si_(wafer)。更有趣的是,分压P_(sio)确实在10 nm的范围内施加了第一代纳米线的初始最小半径。纳米线将由于新的亚稳态平衡SiO_(2,amorphous)/ Si_(nanowire)而增长。

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