Structure and properties of aluminium-oxide thin films produced by the method of magnetron sputtering

摘要

An influence of parameters of the Al_2O_3-films'deposition process using the planar-type high-frequency magnetrondischarge on the film structure, phase composition, porosity, andelectric strength is studied. It is shown that multiphasepolycrystalline coatings with the stable #alpha# -structure, smallporosity, and high values of electric strength are formed underconditions, which guarantee a high adatom mobility on acondensation surface. The limit values of parameterscorresponding to forming amorphous and metastable phases withinthe films are determined. Data on the surface morphology andmicrohardness of films based on A1_2O_3, are given.