Influence of Substrate on Structure and Magnetic Properties of Bi_(0.9)Nd_(0.1)FeO_3 Thin Films by Radio Frequency Magnetron Sputtering Method

摘要

Bi_(0.9)Nd_(0.1)FeO_3 (BNFO) films were deposited on Si (100) and (La,Sr)(Al,Ta)O_3 (100) (LAST) substrate by radio frequency (RF) magnetron sputtering method respectively. The structure, morphology and magnetic properties were studied. X-ray diffraction (XRD) result indicates that the BNFO films on different substrate adopted different orientation. Cross-section scanning electron microscopy shows that the film thickness is 145 nm. Magnetic properties measurement shows that the film on Si(100) substrate has the larger saturation magnetization (Ms) of 3 686 emu/cm~3, while the Ms value of the BNFO films on LSAT(100) substrate is only 1 213 emu/cm~3.