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Effects of silane precursors on curing behavior of UV-curable hybrid coatings A photo-DSC study

机译:硅烷前体对可紫外光固化混合涂料固化行为的影响光DSC研究

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摘要

This study demonstrates the effect of some commonly used silane precursors on curing behavior and photopolymerization kinetics of UV-curable hybrid coatings. Tetraethoxyorthosilane (TEOS), vinyltrimethoxysilane (VTMS), and 3-methacryloxypropyltrimethoxysilane (MPS) were polymerized under acidic conditions by the sol-gel method. The resulting structure of the tested siloxane oligomers was characterized using Si-29-NMR and H-1-NMR spectroscopy. Photo-DSC was used to evaluate photocuring enthalpy. A fully integrated model was applied to investigate propagation rate coefficients and to identify the most effective termination mechanism (monomolecular, bimolecular, or mixed). Results showed that oligomers containing MPS effectively promoted total heat of the polymerization process and consequently affected the maximum rate of polymerization and final double bond conversion. Enthalpy rating for samples containing MPS was higher than that of those containing VTMS, showing that MPS was more compatible with the acrylate systems. In addition, evaluations for photopolymerization kinetic constants proved that non-functional oligomers containing TEOS caused radical trapping and increased activity of the monomolecular termination mechanism.
机译:这项研究证明了一些常用的硅烷前体对可紫外线固化的杂化涂料的固化行为和光聚合动力学的影响。通过溶胶-凝胶法在酸性条件下聚合四乙氧基原硅烷(TEOS),乙烯基三甲氧基硅烷(VTMS)和3-甲基丙烯酰氧基丙基三甲氧基硅烷(MPS)。使用Si-29-NMR和H-1-NMR光谱表征所测试的硅氧烷低聚物的所得结构。 Photo-DSC用于评估光固化焓。应用了一个完全集成的模型来研究传播速率系数并确定最有效的终止机制(单分子,双分子或混合)。结果表明,含MPS的低聚物有效地促进了聚合过程中的总热量,因此影响了最大聚合速率和最终的双键转化率。含MPS的样品的焓定值高于含VTMS的样品,表明MPS与丙烯酸酯体系更相容。此外,对光聚合动力学常数的评估证明,含有TEOS的非功能性低聚物会引起自由基捕获并增加单分子终止机理的活性。

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