We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with secondary maxima that are well separated from the central peak. Numerical simulation of a lithography experiment using a magneto-optical trap as a source of cold Cs atoms, collimation and cooling in a magnetic guide, and optical focusing predicts FWHM pixel sizes of 110 X 110 nm and writing times of similar to 20 ms/pixel. (c) 2006 Optical Society of America.
展开▼
机译：我们分析了一种使用准直原子束的光学聚焦对任意二维图案进行串行写入的方法。在侧面照明几何结构中使用空间光调制器，以创建具有与中心峰良好分离的次要最大值的局部光斑。使用磁光阱作为冷Cs原子源，在磁导中进行准直和冷却以及光学聚焦的光刻实验的数值模拟，预测FWHM像素尺寸为110 X 110 nm，写入时间接近20 ms /像素。 （c）2006年美国眼镜学会。
展开▼
