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首页> 外文期刊>Journal of synchrotron radiation >Performance of a silicon monochromator under high heat load
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Performance of a silicon monochromator under high heat load

机译:硅单色仪在高热负荷下的性能

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The performance of a cryogenically cooled double-crystal silicon monochromator was studied under high-heat-load conditions with total absorbed powers and power densities ranging from 8 to 780 W and from 8 to 240 W mm~(-2), respectively. When the temperature of the first crystal is maintained close to the temperature of zero thermal expansion of silicon, the monochromator shows nearly ideal performance with a thermal slope error of 0.6 μrad. By tuning the size of the first slit, the regime of the ideal performance can be maintained over a wide range of heat loads, i.e. from power densities of 110 W mm~(-2) (at total absorbed power of 510 W) to 240 W mm~(-2) (at total absorbed power of 240 W).
机译:研究了在高热负荷条件下低温冷却的双晶硅单色仪的性能,其总吸收功率和功率密度分别为8至780 W和8至240 W mm〜(-2)。当第一晶体的温度保持在接近硅的零热膨胀温度时,单色仪显示出近乎理想的性能,热斜率误差为0.6μrad。通过调整第一条狭缝的大小,可以在较宽的热负荷范围内保持理想的性能,即从110 W mm〜(-2)的功率密度(510 W的总吸收功率)到240的功率密度W mm〜(-2)(在240 W的总吸收功率下)。

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