首页> 外文期刊>Journal of the Korean Physical Society >Effects of C-60 Concentration on the Storage Density in Nonvolatile Memory Devices Fabricated by Utilizing Hybrid Nanocomposites Consisting of C-60 Embedded in a Polymethyl Methacrylate Polymer Layer
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Effects of C-60 Concentration on the Storage Density in Nonvolatile Memory Devices Fabricated by Utilizing Hybrid Nanocomposites Consisting of C-60 Embedded in a Polymethyl Methacrylate Polymer Layer

机译:C-60浓度对利用包含嵌入甲基丙烯酸甲酯聚合物层中的C-60的杂化纳米复合材料制造的非易失性存储器件中存储密度的影响

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摘要

Nonvolatile memory devices based on a hybrid polymethyl methacrylate (PMMA) layer containing fullerene (C-60) were formed by using a spin coating method. Capacitance-voltage (C-V) measurements on Al/C-60 embedded in PMMA/p-Si (100) devices at 300 K showed a hysteresis with a large flatband voltage shift due to the existence of C-60 molecules, indicative of the charge storage in the C-60 molecules. The magnitude of the flatband voltage shift for the devices with an active layer consisting of PMMA and C-60 hybrid nanocomposites increased with increasing C-60 concentration. Operating mechanisms of the writing and the erasing processes for the Al/C-60 embedded in PMMA/p-Si devices are described on the basis of the C-V results.
机译:通过使用旋涂法形成基于含有富勒烯(C-60)的混合聚甲基丙烯酸甲酯(PMMA)层的非易失性存储器件。在300 K下对嵌入在PMMA / p-Si(100)器件中的Al / C-60进行的电容电压(CV)测量显示,由于存在C-60分子,该磁滞具有较大的平带电压偏移,这表明存在电荷储存在C-60分子中。具有由PMMA和C-60杂化纳米复合材料组成的有源层的器件的平带电压偏移幅度随C-60浓度的增加而增加。基于C-V结果描述了嵌入在PMMA / p-Si器件中的Al / C-60的写入和擦除过程的操作机制。

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