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首页> 外文期刊>Journal of the European Ceramic Society >Processing of Foturan~R glass ceramic substrates for micro-solid oxide fuel cells
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Processing of Foturan~R glass ceramic substrates for micro-solid oxide fuel cells

机译:用于微固体氧化物燃料电池的Foturan〜R玻璃陶瓷基板的加工

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The microfabrication of Foturan~R glass ceramic as a potential substrate material for micro-solid oxide fuel cells (micro-SOFC) was investigated. Foturan~R was etched in 10% aqueous hydrofluoric (HF) acid solution at 25 °C with a linear rate of 22 ± 1.7 ìm/min to create structures with an aspect ratio of 1:1 in 500 ìm-thick Foturan~R substrates for micro-SOFCs. The concentration of the HF etchant was found to influence the etching rate, whereas the UV-exposure time creating nuclei in the glass for subsequent crystallization of the amorphous Foturan~R material had no significant influence on the etching rates. The surface roughness of the crystallized Foturan~R was determined by the crystallite size in the order of 10-15 ìm. Free-standing micro-SOFC membranes consisting of a thin film Pt cathode, an yttria-stabilized-zirconia electrolyte and a Pt anode were released by HF etching of the Foturan~R substrate. An open-circuit voltage of 0.57 V and a maximum power density of 209 mW/cm~2 at 550 °C were achieved.
机译:研究了作为潜在的微固体氧化物燃料电池(micro-SOFC)基材的Foturan〜R玻璃陶瓷的微细加工。在25°C的10%氢氟酸(HF)水溶液中以22±1.7ìm/ min的线性速率蚀刻Foturan〜R,以在500ìm厚的Foturan〜R基板中创建纵横比为1:1的结构用于微型SOFC。发现HF蚀刻剂的浓度影响蚀刻速率,而在玻璃中形成核以​​随后使无定形Futuran_R材料随后结晶的UV暴露时间对蚀刻速率没有显着影响。结晶的Futuran_R的表面粗糙度由晶粒尺寸确定,约为10-15μm。通过对Foturan〜R基板进行HF蚀刻,可释放由薄膜Pt阴极,氧化钇稳定的氧化锆电解质和Pt阳极组成的自立式微型SOFC膜。在550°C下实现了0.57 V的开路电压和209 mW / cm〜2的最大功率密度。

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