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首页> 外文期刊>Journal of Semiconductors >Accurate surface potential determination in Schottky diodes by the use of a correlated current and capacitance voltage measurements. Application to n-InP
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Accurate surface potential determination in Schottky diodes by the use of a correlated current and capacitance voltage measurements. Application to n-InP

机译:通过使用相关的电流和电容电压测量,可以准确地确定肖特基二极管中的表面电势。应用于n-InP

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摘要

Based on current voltage (I –V_g) and capacitance voltage (C–V_g) measurements, a reliable procedure is proposed to determine the effective surface potential Vd (V_g) in Schottky diodes. In the framework of thermionic emission, our analysis includes both the effect of the series resistance and the ideality factor, even voltage dependent. This technique is applied to n-type indium phosphide (n-InP) Schottky diodes with and without an interfacial layer and allows us to provide an interpretation of the observed peak on the C–V_g measurements. The study clearly shows that the depletion width and the flat band barrier height deduced from C–V_g, which are important parameters directly related to the surface potential in the semiconductor, should be estimated within our approach to obtain more reliable information.
机译:根据当前电压(I–V_g)和电容电压(C–V_g)的测量结果,提出了一种可靠的程序来确定肖特基二极管中的有效表面电势Vd(V_g)。在热电子发射的框架中,我们的分析同时包括了串联电阻的影响和理想因子,甚至取决于电压。这项技术适用于具有和不具有界面层的n型磷化铟(n-InP)肖特基二极管,它使我们能够解释C–V_g测量中观察到的峰值。研究清楚地表明,从C–V_g推导出的耗尽宽度和平坦带势垒高度是与半导体表面电势直接相关的重要参数,应该在我们的方法中进行估算以获得更可靠的信息。

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