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An ultra-low-power area-efficient non-volatile memory in a 0.18 μm single-poly CMOS process for passive RFID tags

机译:采用0.18μm单晶CMOS工艺的超低功耗面积高效非易失性存储器,用于无源RFID标签

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This paper presents an ultra-low-power area-efficient non-volatile memory (NVM) in a 0.18 μm single-poly standard CMOS process for passive radio frequency identification (RFID) tags. In the memory cell, a novel low-power operation method is proposed to realize bi-directional Fowler - Nordheim tunneling during write operation. Furthermore, the cell is designed with PMOS transistors and coupling capacitors to minimize its area. In order to improve its reliability, the cell consists of double floating gates to store the data, and the 1 kbit NVM was implemented in a 0.18 μm single-poly standard CMOS process. The area of the memory cell and 1 kbit memory array is 96 μm 2 and 0.12 mm2, respectively. The measured results indicate that the program/erase voltage ranges from 5 to 6 V The power consumption of the read/write operation is 0.19 μW/0.69 μW at a read/write rate of (268 kb/s)/(3.0 kb/s).
机译:本文介绍了一种采用0.18μm单多晶硅标准CMOS工艺的超低功耗区域效率非易失性存储器(NVM),用于无源射频识别(RFID)标签。在存储单元中,提出了一种新颖的低功耗操作方法,以在写操作期间实现双向Fowler-Nordheim隧穿。此外,该单元设计有PMOS晶体管和耦合电容器以最小化其面积。为了提高其可靠性,该单元由双浮栅组成以存储数据,并以0.18μm单多晶硅标准CMOS工艺实现了1 kbit NVM。存储单元和1 kbit存储阵列的面积分别为96μm2和0.12 mm2。测量结果表明,编程/擦除电压范围为5至6V。在(268 kb / s)/(3.0 kb / s)的读/写速率下,读/写操作的功耗为0.19μW/ 0.69μW。 )。

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