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首页> 外文期刊>Journal of Photochemistry and Photobiology, A. Chemistry >FTO/ITO double-layered transparent conductive oxide for dye-sensitized solar cells
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FTO/ITO double-layered transparent conductive oxide for dye-sensitized solar cells

机译:用于染料敏化太阳能电池的FTO / ITO双层透明透明导电氧化物

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New transparent conductive oxide (TCO) films, fluorine-doped tin oxide (FTO) films coated on indium–tin oxide (ITO) films, were developed for dye-sensitized solar cells (DSC). These transparent conductive films were prepared by a spray pyrolysis deposition (SPD) method at a substrate temperature of 350 °C in ITO and 400 °C in FTO. For ITO deposition, an ethanol solution of indium(III) chloride, InCl_3·4H_2O, and tin(II) chloride, SnCl_2·2H_2O (Sn/(In+Sn), 5 at.%) was sprayed on a TEMPAX #8330 glass substrate (100×100×1.1 mm~3). After the deposition of ITO, FTO films were consecutively deposited for protecting oxidation of ITO films. FTO deposition was carried out by an ethanol solution of tin(IV) chloride, SnCl_4·5H_2O within the saturated water solution of NH_4F. These films achieved the lowest resistivity of 1.4×10~(-4) cm and the optical transmittance of more than 80% in the visible range of the spectrum. The electrical resistance of these films increased by less than 10% even though exposed to high temperatures of 300–600 °C for 1 h in the air. The DSC composed of the films were fabricated to confirm their availability. The films were of large size, 100×100 mm~2. The DSC were made by conventional method. As a result, energy conversion efficiency of =3.7% was obtained.
机译:新的透明导电氧化物(TCO)膜,涂在铟锡氧化物(ITO)膜上的氟掺杂氧化锡(FTO)膜被开发用于染料敏化太阳能电池(DSC)。这些透明导电膜是通过喷雾热解沉积(SPD)方法在ITO中的基板温度为350°C,在FTO中的基板温度为400°C的条件下制备的。对于ITO沉积,将氯化铟(III),InCl_3·4H_2O和氯化锡(II),SnCl_2·2H_2O(Sn /(In + Sn),5 at。%)的乙醇溶液喷雾到TEMPAX#8330玻璃上基板(100×100×1.1 mm〜3)。沉积ITO之后,连续沉积FTO膜以保护ITO膜的氧化。 FTO沉积是在NH_4F饱和水溶液中用氯化锡(IV)的乙醇溶液SnCl_4·5H_2O进行的。在可见光谱范围内,这些薄膜的最低电阻率为1.4×10〜(-4)cm,透光率超过80%。即使在空气中暴露于300–600°C的高温1小时,这些薄膜的电阻也增加了不到10%。制作了由薄膜组成的DSC,以确认其可用性。膜尺寸大,为100×100mm〜2。 DSC通过常规方法制备。结果,获得了= 3.7%的能量转换效率。

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