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首页> 外文期刊>Journal of Surfaces and Interfaces of Materials >Proposed a Tunnel Field-Effect Transistor with High ON-State Current by Using Full Depleted Source Structure
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Proposed a Tunnel Field-Effect Transistor with High ON-State Current by Using Full Depleted Source Structure

机译:提出了一种利用全耗尽型源极结构的高导通电流隧道型场效应晶体管

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In this work, we present a novel germanium tunnel field-effect transistor structure to overcome the issue of low ON state current in conventional tunnel field-effect transistors. The working principle is demonstrated and the performance is explored by using two-dimensional device simulator. The simulated results show a steep average subthreshold slope S = 51 mV/dec over seven decades of drain current, I_(ON)/I_(OFF) ratio of 10~7, and drain current of I_(ON) = 5 μA/μm at V_(DD) = 0.5 V, implying the potential application of this tunnel field-effect transistor to low power logic circuit. Moreover, the simple device structure is readily extended to other semiconductor nanofilm devices such as InGaAs and graphene.
机译:在这项工作中,我们提出了一种新颖的锗隧道场效应晶体管结构,以克服常规隧道场效应晶体管中低导通状态电流的问题。通过使用二维设备模拟器演示了其工作原理并探索了性能。仿真结果表明,在七十年的漏极电流中,平均亚阈值斜率S = 51 mV / dec,I_(ON)/ I_(OFF)比率为10〜7,I_(ON)= 5μA/μm当V_(DD)= 0.5 V时,表明该隧道场效应晶体管在低功率逻辑电路中的潜在应用。此外,简单的器件结构易于扩展到其他半导体纳米膜器件,例如InGaAs和石墨烯。

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