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首页> 外文期刊>Journal of surface investigation: x-ray, synchrotron and neutron techniques >Investigation of the interface of insulated silicon tensoresistive Frame-on-Silicon heterostructure for MEMS pressure transducers
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Investigation of the interface of insulated silicon tensoresistive Frame-on-Silicon heterostructure for MEMS pressure transducers

机译:MEMS压力传感器绝缘硅张阻硅框架异质结构界面的研究

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摘要

The results of analysis of the surface morphology of transition regions at the interfaces of a hetero-structure of single silicon Cglassy dielectric Csingle silicon, used as a chip in the microelectromechanical systems (MEMS) of tensoresistive pressure transducers, are presented. The interfaces are studied by scanning electron microscopy and atomic-force microscopy (AFM). Possible reasons for the formation of local centers of mechanical stress in the transition regions and at the chip surface are discussed.
机译:给出了单张硅玻璃介电单硅的异质结构界面上过渡区表面形态的分析结果,该单硅在张阻式压力传感器的微机电系统(MEMS)中用作芯片。通过扫描电子显微镜和原子力显微镜(AFM)研究界面。讨论了在过渡区域和切屑表面形成机械应力局部中心的可能原因。

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