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首页> 外文期刊>Journal of solid state electrochemistry >Processes, parameters and mechanisms controlling the normal and abnormal growth of porous anodic alumina films
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Processes, parameters and mechanisms controlling the normal and abnormal growth of porous anodic alumina films

机译:控制多孔阳极氧化铝膜正常和异常生长的过程,参数和机理

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摘要

Aluminium was anodised in H_2SO_4 solutions 0.25-1.53 M, temperatures 0-35 C, times up to 90 min and voltage 25 V. Anodising was followed chronoamperometrically. The passing charge, consumed Al, formed oxide, transport numbers of oxygen anions in barrier layer and film thicknesses were determined. Films were examined to detect abnormal film growth, called burning. It was found that the current in Al anode is closely solely ionic, and the only processes occurring are those related with ionic charge transport and heat release and its abduction for which suitable equations were formulated relating many parameters. At each concentration, the temperatures, current densities and times up to which normal film growth occurs and above which stain-like mild, island-like intermediate, strong, strong-destructive and mixed burning appears were found. Burning emerges at lower concentrations, temperatures and times for thinner Al. Low concentrations and temperatures among thresholds where mild and next-kind burning first appear define windows of conditions where thick enough dark or black films grow. Peculiar chronoamperometric plot characterises each film growth type. Though other burning kinds can appear at each surface region or in the whole surface, strong and strong-destructive emerge only at the lower Al side around which the efficiency of solution stirring is highest. The mechanisms of normal and abnormal film growth were formulated showing that different processes and interacting variable parameters, some of which are noted for first time, regulate each film growth type. These can predict methods to avoid abnormal film growth.
机译:铝在0.25-1.53​​ M的H_2SO_4溶液中进行阳极氧化,温度为0-35 C,时间长达90分钟,电压为25V。以计时电流法进行阳极氧化。测定通过的电荷,消耗的Al,形成的氧化物,氧阴离子在阻挡层中的迁移数和膜厚度。检查胶片以检测异常胶片生长,称为燃烧。已经发现,Al阳极中的电流几乎完全是离子性的,并且发生的唯一过程是与离子电荷传输和放热以及其诱变有关的那些过程,针对这些过程制定了与许多参数相关的合适方程式。在每种浓度下,都发现了温度,电流密度和发生正常膜生长的时间,超过此温度则出现了污点状的轻度,岛状中间,强,强破坏性和混合燃烧。对于较薄的Al,在较低的浓度,温度和时间下会出现燃烧。在首次出现轻度燃烧和第二种燃烧的阈值之间的低浓度和温度定义了生长足够厚的深色或黑色薄膜的条件窗口。特殊的计时安培图描绘了每种薄膜的生长类型。尽管其他燃烧类型可以出现在每个表面区域或整个表面,但是强而强破坏性仅出现在溶液搅拌效率最高的较低的Al侧。制定了正常和异常薄膜生长的机制,表明不同的过程和相互作用的可变参数(其中一些是首次注意到)调节每种薄膜的生长类型。这些可以预测避免异常膜生长的方法。

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