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Porous Alumina Films Fabricated by Reduced Temperature Sulfuric Acid Anodizing: Morphology Composition and Volumetric Growth

机译:通过降低的温度硫酸阳极氧化制造多孔氧化铝薄膜:形态组成和体积生长

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摘要

The volumetric growth, composition, and morphology of porous alumina films fabricated by reduced temperature 280 K galvanostatic anodizing of aluminum foil in 0.4, 1.0, and 2.0 M aqueous sulfuric acid with 0.5–10 mA·cm−2 current densities were investigated. It appeared that an increase in the solution concentration from 0.4 to 2 M has no significant effect on the anodizing rate, but leads to an increase in the porous alumina film growth. The volumetric growth coefficient increases from 1.26 to 1.67 with increasing current density from 0.5 to 10 mA·cm−2 and decreases with increasing solution concentration from 0.4 to 2.0 M. In addition, in the anodized samples, metallic aluminum phases are identified, and a tendency towards a decrease in the aluminum content with an increase in solution concentration is observed. Anodizing at 0.5 mA·cm−2 in 2.0 M sulfuric acid leads to formation of a non-typical nanostructured porous alumina film, consisting of ordered hemispheres containing radially diverging pores.
机译:研究了由0.4,1.0和2.0M和2.0M硫酸水溶液氧化铝铝箔的降低的280k电流阳极氧化阳极氧化,具有0.5-10mA·CM-2电流密度的多孔氧化铝膜的体积生长,组合物和形态。似乎溶液浓度从0.4〜2μm的增加对阳极氧化速率没有显着影响,但导致多孔氧化铝膜生长的增加。体积生长系数从1.26到1.67增加,电流密度增加到0.5至10mA·cm-2,随着0.4至2.0米的溶液浓度的增加而降低。另外,在阳极氧化样品中,鉴定金属铝相,和一个观察到溶液浓度增加的铝含量减少的趋势。在2.0M硫酸中的0.5 mA·cm-2处的阳极氧化导致非典型的纳米结构多孔氧化铝膜,由含有径向发散孔的有序半球组成。

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