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Discovery bu kinetic studies of the latent physicochemical processes and their mechanisms during the grwoth of porous anodic alumina films in sulfate electrolytes

机译:硫酸电解质中多孔阳极氧化铝膜生长过程中潜在的物理化学过程及其机理的发现动力学

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摘要

The kinetic of growth of porous anoidc alumina films in pure H_2SO_4, in mixtures in H_2SO_4 and Al_2(SO_4)_3 and in Al(HSO_4)_3, NaHSO_4 and KHSO_4 electrolytes were studied. The latent physicochemical processes at the pore base surface/electrolyte interface, across the barrier layer, inside the metal/oxide interface and at the pore wall surface/electrolyte interface and their mechanisms were revealed. High field strength equations were formulated describing the ionic migrations from the pore base surface. These showed that, at constant current density and temperature, the inverse of the pore base square diameter depends linearly on the inverse of the H~+ activity in the anodizing solution and that this diameter increases with H~+ activity, in agreement with the experimental results. The mechanism of electrolyte anion incorporation inside the barrier layer and the real distribution of the anion concentration across both the barrier layer and pore walls were deduced. The effects of the different kinds and concentration of the electrolyte anions and cations on both the above processes and their mechanisms were also examined.
机译:研究了在纯H_2SO_4,H_2SO_4和Al_2(SO_4)_3的混合物以及Al(HSO_4)_3,NaHSO_4和KHSO_4电解质的混合物中多孔阳极氧化铝膜的生长动力学。揭示了在孔基础表面/电解质界面,穿过阻挡层,金属/氧化物界面内部以及在孔壁表面/电解质界面的潜在物理化学过程及其机理。建立了高场强方程,描述了从孔底表面的离子迁移。这些表明,在恒定的电流密度和温度下,孔底平方直径的倒数与阳极氧化溶液中H〜+活性的倒数线性相关,并且该直径随H〜+活性而增加,这与实验结果一致。结果。推导了电解质阴离子掺入阻挡层内部的机理以及阴离子浓度在阻挡层和孔壁​​之间的真实分布。还研究了不同种类和浓度的电解质阴离子和阳离子对上述过程及其机理的影响。

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