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首页> 外文期刊>Journal of Sol-Gel Science and Technology >Influence of single layer thickness on the performance of undoped and Mg-doped CuCrO2 thin films by sol-gel processing
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Influence of single layer thickness on the performance of undoped and Mg-doped CuCrO2 thin films by sol-gel processing

机译:溶胶-凝胶法单层厚度对非掺杂和掺镁CuCrO2薄膜性能的影响

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摘要

Transparent conductive thin films of copper chromium oxide were processed on borosilicate glass by sol-gel technique. The resistivity of the films was decreased by lowering the single layer thickness of multilayer stacks deposited by dip-coating, as well as by doping with magnesium. The additional effort of increasing the number of coating cycles from four to fifteen and sintering after each coating resulted in denser films with increased crystallite size. But whereas conductivity was improved by this procedure, the transmittance of the thin films simultaneously dropped by more than 10%. The optimum values obtained for an Mg-doped sample were ρ = 0.38Ω cm at T = 26.8%.
机译:采用溶胶-凝胶技术在硼硅酸盐玻璃上加工了透明的铜铬氧化物导电薄膜。通过降低通过浸涂以及通过掺杂镁沉积的多层堆叠的单层厚度,降低了膜的电阻率。将涂层循环数从四个增加到十五个并在每次涂层后进行烧结的额外努力导致了致密的薄膜,晶粒尺寸增大。但是,尽管通过这种方法提高了导电性,但薄膜的透射率却同时下降了10%以上。在T = 26.8%时,Mg掺杂样品的最佳值为ρ=0.38Ωcm。

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