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I-V-T analysing an inhomogeneous Au/Poly(4-vinyl phenol)/p-Si structure with a double Gaussian distribution of barrier heights

机译:I-V-T分析势垒高度双高斯分布的非均质Au /聚(4-乙烯基苯酚)/ p-Si结构

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In this study, the current-voltage (I-V) characteristics of Au/Poly(4-vinyl phenol)/p-Si structures have been measured over a wide temperature range (100-300 K). These structures have been analyzed according to thermionic emission (TE) theory, as a result of which an abnormal decrease occurred in the zero-bias barrier height (φ_(b0)) and an increase in the ideality factor (n) was observed with temperature decrease and nonlinearity in the activation energy plot. By assuming a Gaussian distribution (GD) of barrier heights of the Au/Poly(4-vinyl phenol)/p-Si structures, barrier inhomogeneities are believed to responsible for this behavior. Evidence is given for the existence of a double GD with mean barrier heights (φ_(b0)) of 1.042 and 0.623 eV, standard deviations of 0.138 and 0.081 V, and ideality factors 2.76 and 7.26, which remain effective in the temperature ranges of 180-300 and 100-160 K, respectively. As aresult, without using the temperature coefficient of the barrier height, the modified ln(I0/T~2) - q~2σ_o~2/2(kT)~2 vs. q/kT plot gives φ_(b0) values and Richardson constants (A*) as 1.036 and 0.623 eV, and 36.20 and 19.99 A/cm~2 K~2, respectively. The effective Richardson constant value of 36.20 A/cm~2 K~2 is very similar to the theoretical value of 32 A/cm~2K~2 for p-Si. Consequently, the temperature dependence of the forward bias I-V characteristics of Au/Poly(4-vinyl phenol)//p-Si (MIS) structure could be attributed to the thermionic emission (TE) mechanism with double GD of the barrier heights.
机译:在这项研究中,已在较宽的温度范围(100-300 K)范围内测量了Au /聚(4-乙烯基苯酚)/ p-Si结构的电流-电压(I-V)特性。根据热电子发射(TE)理论对这些结构进行了分析,结果是零偏压势垒高度(φ_(b0))出现异常减小,并且理想因子(n)随着温度的升高而增大减少和活化能图中的非线性。通过假设Au /聚(4-乙烯基苯酚)/ p-Si结构的势垒高度的高斯分布(GD),认为势垒不均匀性是造成这种现象的原因。有证据表明存在双重GD,其平均势垒高度(φ_(b0))为1.042和0.623 eV,标准偏差为0.138和0.081 V,理想因子为2.76和7.26,它们在180°C的温度范围内仍然有效-300和100-160K。结果,在不使用势垒高度的温度系数的情况下,修正的ln(I0 / T〜2)-q〜2σ_o〜2/2(kT)〜2与q / kT的关系图给出了φ_(b0)值和理查森常数(A *)为1.036和0.623 eV,分别为36.20和19.99 A / cm〜2 K〜2。理查森的有效常数为36.20 A / cm〜2 K〜2,与p-Si的理论值32 A / cm〜2K〜2非常相似。因此,金/聚(4-乙烯基苯酚)// p-Si(MIS)结构的正向偏压I-V特性与温度的关系可以归因于热电子发射(TE)机理,势垒高度为GD的两倍。

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