Run-to-run (R2R) control is a process control technique for batch-processing environments in which an algorithm is used to adjust process parameters prior to each batch (run). Information from previous runs, prior process inputs, or environmental information might all play a part in the control algorithm. The authors make a convincing point that run-to-run control has been very successful and has widespread application in the semiconductor industry, and is, in fact, 'the least equipment-invasive control scheme that demonstrates real benefit." This book is not a loose collection of case studies or a group of unrelated articles; it is, rather. a complete and integrated treatment of the subject of run-to-run control in its present state of development. The technical content exhibits the benefit of years of research through Sematech and excellent scholarship with over 300 references included. Both the theory of run-to-run control and the realities of implementation hi modern manufacturing environments are covered. The seven main parts of the book are described below.
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