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首页> 外文期刊>Journal of Physics. Condensed Matter >The frictional drag force between quantum wells mediated by a fluctuating electromagnetic field
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The frictional drag force between quantum wells mediated by a fluctuating electromagnetic field

机译:波动电磁场介导的量子阱之间的摩擦阻力

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We use the theory of the fluctuating electromagnetic field to calculate the frictional drag force between nearby two- and three-dimensional electron systems. The frictional drag results from coupling via a fluctuating electromagnetic field, and can be considered as the dissipative part of the van der Waals interaction. Unlike in other similar calculations for semiconductor two-dimensional systems, here retardation effects are included. We consider the dependence of the frictional drag force on the temperature T, electron density and separation d. We find that retardation effects become the dominating factor for high electron densities n(s), corresponding to thin metallic film, for separation d > 10(epsilon (s))(1/2), where epsilon is the dielectric constant, and suggest a new experiment to test the theory. The relation between friction and heat transfer is also briefly commented on. [References: 39]
机译:我们使用波动电磁场的理论来计算附近的二维和三维电子系统之间的摩擦阻力。摩擦阻力是通过波动的电磁场耦合产生的,可以看作是范德华相互作用的耗散部分。与半导体二维系统的其他类似计算不同,此处包括延迟效应。我们考虑了摩擦阻力对温度T,电子密度和间距d的依赖性。我们发现,对于间距d> 10(epsilon / n(s))(1/2)(其中ε是介电常数),延迟效应成为高电子密度n(s)(与金属薄膜相对应)的主要因素,并提出一个新的实验来验证这一理论。摩擦和热传递之间的关系也作了简要评论。 [参考:39]

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