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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Pulsed laser deposition of compact high adhesion polytetrafluoroethylene thin films
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Pulsed laser deposition of compact high adhesion polytetrafluoroethylene thin films

机译:紧凑型高附着力聚四氟乙烯薄膜的脉冲激光沉积

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Polytetrafluoroethylene (PTFE) thin films were prepared from pressed powder pellets via pulsed laser deposition by using ArF (193 nm) excimer laser. The applied laser fluences were in the 1.6-10 J cm(-2) range,the substrate temperature was varied between 27degreesC and 250degreesC and post-annealing of the films was carried out in air at temperatures between 320degreesC and 500degreesC. Films deposited at 250degreesC substrate temperature were found to be stoichiometric while those prepared at lower temperatures were fluorine deficient. Morphological analyses proved that the film thickness did not significantly depend on the substrate temperature and the post annealing at 500degreesC resulted in a thickness reduction of approximately 50%. It was demonstrated that the films prepared at 8.2 J cm(-2) fluence and annealed at 500degreesC followed by cooling at 1degreesC min(-1) rate were compact, pinhole-free layers. The adherence of films to the substrates was determined by tensile strength measurements. Tensile strength values up to 2.4 MPa were obtained. These properties are of great significance when PTFE films are fabricated for the purpose of protecting coatings. [References: 16]
机译:聚四氟乙烯(PTFE)薄膜是由压制的粉末颗粒通过使用ArF(193 nm)准分子激光器进行脉冲激光沉积而制备的。所施加的激光能量密度在1.6-10 J cm(-2)的范围内,基板温度在27°C至250°C之间变化,并且薄膜的后退火在空气中在320°C至500°C之间的温度下进行。发现在250℃的基板温度下沉积的膜是化学计量的,而在较低温度下制备的膜是氟缺乏的。形态分析证明,膜厚度不显着取决于基底温度,并且在500℃下的后退火导致厚度减小约50%。结果表明,以8.2 J cm(-2)能量通量制备并在500°C退火,然后以1°C min(-1)速率冷却的薄膜是致密的,无针孔的层。膜对基材的粘附力通过拉伸强度测量来确定。获得的拉伸强度值高达2.4 MPa。当为保护涂层而制造PTFE膜时,这些性能具有重要意义。 [参考:16]

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