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首页> 外文期刊>Journal of Physics, B. Atomic, Molecular and Optical Physics: An Institute of Physics Journal >Planar channelling of 855 MeV electrons in silicon: Monte Carlo simulations
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Planar channelling of 855 MeV electrons in silicon: Monte Carlo simulations

机译:硅中855 MeV电子的平面沟道:蒙特卡洛模拟

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摘要

A new Monte Carlo code for the simulation of the channelling of ultrarelativistic charged projectiles in single crystals is presented. A detailed description of the underlying physical model and the computation algorithm is given. The first results obtained with the code for the channelling of 855 MeV electrons in silicon crystal are presented. The dechannelling lengths for (1 0 0), (1 1 0) and (1 1 1) crystallographic planes are estimated. In order to verify the code, the dependence of the intensity of the channelling radiation on the crystal dimension along the beam direction is calculated. A good agreement of the obtained results with recent experimental data is observed.
机译:提出了一种新的蒙特卡洛代码,用于模拟超相对论带电弹丸在单晶中的通道。给出了基础物理模型和计算算法的详细描述。给出了用855 MeV电子在硅晶体中沟道的代码获得的第一个结果。估计(1 0 0),(1 1 0)和(1 1 1)晶面的去沟道长度。为了验证代码,计算了沿束方向的通道辐射强度对晶体尺寸的依赖性。观察到所得结果与最近的实验数据有很好的一致性。

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