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首页> 外文期刊>Journal of Physics, B. Atomic, Molecular and Optical Physics: An Institute of Physics Journal >Structural and electronic properties of boron- and nitrogen-doped Si _nC_n (n = 7-15) clusters: A theoretical investigation
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Structural and electronic properties of boron- and nitrogen-doped Si _nC_n (n = 7-15) clusters: A theoretical investigation

机译:硼和氮掺杂的Si _nC_n(n = 7-15)团簇的结构和电子性质:理论研究

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摘要

The structural and electronic properties of Si_nC_n (n = 7-15) cage-like clusters doped with boron and nitrogen atoms have been investigated using spin-polarized density functional calculations. We found that the B@Si_nC_n and N@Si_nC_n clusters energetically favour cage-like structures, and the B/N dopant prefers to be located at the interior/surface site of the Si frame. Theoretical results indicate that four clusters are highly stable, which are B@Si_8C _8, N@Si_(14)C_(14), N@Si_8C_8, and N@Si_(12)C_(12) clusters. On the basis of the lowest-energy structures obtained, the size dependence of electronic properties such as binding energy, gap between the highest occupied molecular orbital and the lowest unoccupied molecular orbital (HOMO-LUMO gap), vertical ionization potential, electron affinity, Mulliken charge, etc has been calculated and analysed.
机译:使用自旋极化密度泛函计算研究了Si_nC_n(n = 7-15)掺杂硼和氮原子的笼状簇的结构和电子性质。我们发现,B @ Si_nC_n和N @ Si_nC_n团簇在能量上倾向于笼状结构,而B / N掺杂剂更倾向于位于Si框架的内部/表面位置。理论结果表明,四个簇高度稳定,分别是B @ Si_8C _8,N @ Si_(14)C_(14),N @ Si_8C_8和N @ Si_(12)C_(12)簇。根据所获得的最低能级结构,电子性质的大小依赖性,例如结合能,最高占据分子轨道与最低未占据分子轨道之间的间隙(HOMO-LUMO间隙),垂直电离势,电子亲和力,Mulliken费用等已进行了计算和分析。

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