New Positive-type Chemically Amplified Photosensitive Poly(phenylene ether): 5 Synthesis of poly(2-hydroxy-6-methylphenylene ether) by oxidative coupling polymerization of 2-trialkylsilyloxy-6-methylphenol

摘要

Photosensitive organic polymers are preferably applied for semiconductor industry such as buffer coating [1], interlayer dielectric and passivation [2], alpha-ray shielding [3], and protecting/insulating materials [4]. The main advantages of using these organic materials in IC and LSI devices are the processbility as well as the ease to form thick film in microscopic portions [5]. It is well known that the electrical performance of ICs can be significantly improved by low k dielectric materials with a good balance of further properties such as high temperature stability, low moisture uptake, and reliable processing [6].