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Development of Liquid Photoresist for IMS (Injection Molded Solder) with High Thermal Stability

机译:具有高热稳定性的IMS(注塑焊料)液体光刻胶的开发

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摘要

Novel bumping technology that can realize high density assembly of IC chips and packages with a high number of I/O is required in the field of electronic packaging. Recently, a novel bumping process called IMS (Injection Molded Solder) was proposed, which enabled direct injection of molten solder into the holes of a photoresist patterned array. In this paper, the current status of photoresist development and recent achievements for obtaining excellent solder filling rates are described. One of the important factors to obtain a high solder filling rate is reducing the amount of outgases from the photoresists at high temperature, as they prevent smooth solder filling into the photoresist holes. In order to solve such an issue, novel photoresists with high thermal stability have been designed and developed.
机译:在电子封装领域中,需要能够实现具有大量I / O的IC芯片和封装的高密度组装的新型凸块技术。最近,提出了一种称为IMS(注模焊料)的新型凸点工艺,该工艺能够将熔融焊料直接注入光致抗蚀剂图案化阵列的孔中。在本文中,描述了光致抗蚀剂的发展现状以及获得优异焊料填充率的最新成果。获得高焊料填充率的重要因素之一是在高温下减少了光致抗蚀剂的脱气量,因为它们阻止了平滑的焊料填充到光致抗蚀剂孔中。为了解决该问题,已经设计并开发了具有高热稳定性的新型光致抗蚀剂。

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