Alkaline-developable Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) and Fluorinated Diazonaphthoquinone

摘要

An alkaline-developable positive-type photosensitive polyimide (PSPI) based on fluorinated poly(amie acid) (FPAA) prepared from 4,4'-hexafluoroisopropyridenebis(phthalic anhydride) and 4,4'-oxydianiline, and fluorinated diazonaphthoquinone (FDNQ) as a dissolution inhibitor has been successfully developed. The solution of FPAA and FDNQ was spin-coated on a silicon wafer and prebaked, inducing a FDNQ rich surface which was supported by measurement of the contact angle of water on the films. The PSPI containing FPAA and FDNQ (25 wt% to FPAA) showed the high sensitivity of 45 mJ/cm~2 and excellent contrast (γ 0) of 10 when it was exposed to 365 nm wavelength light (i-line) and developed with a 2.38 wt% tetramethylammonium hydroxide aqueous solution at 25 °C. A clear positive pattern of a 6-um line and space was obtained on a film when exposed to 120 mJ/cm~2 of i-line by a contact printing method.