Oxygen depth profiling in Kr~+-implanted polycrystalline alpha titanium by means of ~(16)O(α,α)~(16)O resonance scattering

摘要

The ~(16)O(α,α)~(16)O resonance scattering was applied to study the effects of ion implantation on the oxygen distribution in the near surface region of polycrystalline titanium implanted with 180 keV krypton ions at fluences, ranging between 1 × 10~(14) and 5 × 10~(15) Kr~+/cm~2. Two sample sets were chosen: as-received polycrystalline titanium discs rolled and annealed in half-hard condition which had a thick oxygen layer and similar samples in which this surface layer was removed by polishing. An increase of the mean oxygen concentration observed in both unpolished and polished samples at low fluence suggests a knock-on implantation of surface oxygen atoms. At high fluence, an overall decrease in the mean oxygen concentration and mean oxygen depth suggests an out-diffusion of near-surface oxygen atoms.