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首页> 外文期刊>Journal of optoelectronics and advanced materials >Study of photoluminescence in gadolinium chloride treated porous silicon structures
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Study of photoluminescence in gadolinium chloride treated porous silicon structures

机译:氯化ado处理的多孔硅结构中的光致发光研究

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摘要

We report the study of photoluminescence in porous silicon treated with gadolinium chloride (GdCl3), and also in as grown porous silicon. The concentration of the gadolinium on the surface of the porous silicon was determined using an "Inductively Coupled Plasma Mass Spectrometer". The photoluminescence measurements were carried out using a custom made system with a 300 nm light source. The photoluminescence intensity was enhanced drastically in GdCl3 treated porous silicon samples, and was a function of the gadolinium concentration in the porous silicon layer. However, the photoluminescence was quenched when the samples were left in room ambience for several months. The rate of quenching remained almost the same in gadolinium treated porous silicon and in the as grown samples.
机译:我们报道了在用氯化g(GdCl3)处理过的多孔硅中以及在生长的多孔硅中进行光致发光的研究。使用“感应耦合等离子体质谱仪”测定多孔硅表面上the的浓度。使用具有300 nm光源的定制系统进行光致发光测量。在GdCl3处理的多孔硅样品中,光致发光强度大大提高,并且是多孔硅层中the浓度的函数。然而,当样品在室温下放置数月后,光致发光被淬灭。 g处理过的多孔硅和生长样品中的淬灭速率几乎相同。

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