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PHOTOLUMINESCENCE AND XPS STUDY OF SELENIUM TREATED POROUS SILICON

机译:硒处理多孔硅的光致发光和XPS研究

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摘要

The PL is a non-monotonic function of time exposure of PS in Se acid. After initial growth, the PL starts to decrease after exposures of 90 s and more. The XPS analysis shows that the process of redistribution between the silicon-oxygen and silicon-selenium-oxygen bonds takes place after PS surface treatment with selenious acid. No peaks for selenium oxide, free selenium or selenious acid were found in the Se3d spectra, indicating that selenium is bound to the silicon through oxygen.
机译:该PL是Se酸中PS的非单调函数。经过初始增长后,PL在90秒和更多的曝光后开始减少。 XPS分析表明,在PS表面处理用硒酸酸的PS表面处理之后发生硅 - 氧和硅 - 氧键之间的再分配过程。在SE3D光谱中没有发现氧化硒,游离硒或硒酸的峰,表明硒通过氧气与硅结合。

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