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Comparison of methods for determining the coherence of semiconductor laser light based on interference fringe contrast and speckle pattern morphology

机译:基于干涉条纹对比度和斑点图案形态确定半导体激光相干性方法的比较

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We compare the classical technique for determining the coherence length of semiconductor laser light based on the slope of the interference-fringe visibility curve against a speckle technique based on the number of connected domains in the speckle-field interference pattern as determined using the morphological Euler number. The study was performed using a Michelson interferometer where the difference in optical path length between the legs can be adjusted over a range of several centimeters. We report the results from a comparison of these techniques for determining coherence of radiation from semiconductor lasers in the red (650 nm), green (532 nm), and blue (450 nm) regions. We show that the interference-fringe visibility curves and the curves for the morphological Euler numbers as a function of the phase delay induced by the adjustable arm of the interferometer are clearly correlated. The morphological radiation-coherence determination technique based on the speckle-field interference pattern is quite fast and is simpler than the traditional interference-fringe contrast-visibility technique. (C) 2016 Optical Society of America.
机译:我们将基于干涉条纹可见性曲线的斜率确定半导体激光相干长度的经典技术与基于形态欧拉数确定的基于散斑场干涉图案中连接域数量的散斑技术进行比较。该研究使用迈克尔逊干涉仪进行,其中两腿之间的光程长度差异可以在几厘米的范围内进行调节。我们从这些技术的比较中报告了结果,这些技术用于确定红色(650 nm),绿色(532 nm)和蓝色(450 nm)区域中半导体激光器的辐射相干性。我们表明,干涉条纹的可见性曲线与形态欧拉数的曲线与干涉仪的可调臂所引起的相位延迟的函数之间存在明显的相关性。与传统的干涉条纹对比可见性技术相比,基于散斑场干涉图样的形态辐射相干确定技术是一种非常快速,简便的方法。 (C)2016年美国眼镜学会。

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