How the ion-sputtering regime affects the microrelief of holographic diffraction gratings

摘要

The effect of ion sputtering on the line profile of holographic diffraction gratings has been modelled by computer and studied experimentally. It has been established that computer modelling gives a good description of the experimental results, and this makes it possible to use it for a purposeful search for the optimum ion-profiling regimes of holographic diffraction gratings.