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首页> 外文期刊>Journal of Micromechanics and Microengineering >Printed wax masks for 254 nm deep-UV pattering of PMMA-based microfluidics
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Printed wax masks for 254 nm deep-UV pattering of PMMA-based microfluidics

机译:印刷蜡掩膜,用于基于PMMA的微流体的254 nm深紫外图案化

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摘要

This paper reports a new technique for masking deep-UV exposure of poly(methyl methacrylate) (PMMA) using a printed wax mask. This technique provides an inexpensive and bulk fabrication method for PMMA structures. The technique involves the direct printing of the mask onto a polymer sheet using a commercial wax printer. The wax layer was then transferred to a PMMA substrate using a thermal laminator, exposed using deep-UV (with a wavelength of 254 nm), developed in an IPA:water solution, and completed by bonding on a PMMA cap layer. A sample microfluidic device fabricated with this method is also presented, with the microchannel as narrow as 50 μm. The whole process is easy to perform without the requirement for any microfabrication facilities.
机译:本文报道了一种新技术,可使用印刷蜡膜掩盖聚甲基丙烯酸甲酯(PMMA)的深紫外线。该技术提供了用于PMMA结构的便宜且大量的制造方法。该技术涉及使用商业蜡印机将掩模直接印刷到聚合物片材上。然后使用热层压机将蜡层转移到PMMA基材上,使用深紫外光(波长为254 nm)进行曝光,在IPA:水溶液中显影,并通过在PMMA盖层上粘合来完成。还介绍了用这种方法制造的样品微流体装置,其微通道的宽度窄至50μm。整个过程易于执行,而无需任何微加工设备。

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