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Reliable MOSFET operation using two-phase microfluidics in the presence of high heat flux transients

机译:在存在高热通量瞬变的情况下,使用两相微流体使MOSFET可靠运行

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Randomly generated heat flux transients affect the reliability of advanced integrated circuits and can induce severe nonlinearity in the device response, resulting in the degradation of a gate dielectric in metal oxide field effect transistors (MOSFETs). The effect of high heat flux transients on MOSFET operation and mitigation, using single-phase and two-phase on-chip microfluidics, is reported in this paper. A prototype comprising monolithically integrated MOSFETs, resistance temperature detector (RTD) arrays, simulated transient source (microheaters) and microfluidic networks was developed. The application of a 10 s transient (153 W cm~(-2)) led to the degradation of subthreshold swing (S) from 120 to 240 mV/decade. However, in the presence of water flow, effective mitigation of S (up to 75%) is observed. The rate of mitigation is higher at lower flow rates because of the higher heat-transfer efficiency for two-phase flow. Thus, an appropriate selection of flow parameters can lead to optimized cooling. Additionally, we propose a strategy to localize the transient heat sources based on the temperature profiles generated using an on-chip, distributed RTD sensor array. The proposed methodology can be applied in practical integrated circuits for localization and characterization of heat sources leading to modifications in the circuit design or process integration steps.
机译:随机产生的热通量瞬变会影响高级集成电路的可靠性,并可能在设备响应中引起严重的非线性,从而导致金属氧化物场效应晶体管(MOSFET)中栅极电介质的性能下降。本文报道了使用单相和两相片上微流控技术的高热通量瞬变对MOSFET工作和缓解的影响。开发了包含单片集成MOSFET,电阻温度检测器(RTD)阵列,模拟瞬态源(微加热器)和微流体网络的原型。 10 s瞬态(153 W cm〜(-2))的施加导致亚阈值摆幅(S)从120到240 mV /十年的衰减。但是,在有水流的情况下,可以有效缓解S(高达75%)。由于两相流的传热效率较高,因此在较低的流速下缓解率较高。因此,适当选择流量参数可以导致优化的冷却。此外,我们提出了一种基于使用片上分布式RTD传感器阵列生成的温度曲线来定位瞬态热源的策略。所提出的方法可以在实际集成电路中用于热源的定位和表征,从而导致电路设计或工艺集成步骤的修改。

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