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首页> 外文期刊>Journal of Micromechanics and Microengineering >The evaporation and wetting dynamics of sessile water droplets on submicron-scale patterned silicon hydrophobic surfaces
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The evaporation and wetting dynamics of sessile water droplets on submicron-scale patterned silicon hydrophobic surfaces

机译:亚微米级图案化硅疏水表面上无水水滴的蒸发和润湿动力学

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摘要

The evaporation characteristics of 1 μ1 sessile water droplets on hydrophobic surfaces are experimentally examined. The proposed hydrophobic surfaces are composed of submicron diameter and 4.2 μm height silicon post arrays. A digital image analysis algorithm was developed to obtain time-dependent contact angles, contact diameters, and center heights for both non-patterned polydimethylsiloxane (PDMS) surfaces and patterned post array surfaces, which have the same hydrophobic contact angles. While the contact angles exhibit three distinct stages during evaporation in the non-patterned surface case, those in the patterned silicon post array surface case decrease linearly. In the case of post array hydrophobic surfaces, the initial contact diameter remains unchanged until the portion of the droplet above the posts completely dries out. The edge shrinking velocity of the droplet shows nonlinear characteristics, and the velocity magnitude increases rapidly near the last stage of evaporation.
机译:实验检查了疏水表面上1μ1无柄水滴的蒸发特性。提出的疏水表面由亚微米直径和4.2μm高的硅柱阵列组成。开发了一种数字图像分析算法,以获取具有相同疏水接触角的非图案化聚二甲基硅氧烷(PDMS)表面和图案化柱阵列表面的时间相关接触角,接触直径和中心高度。虽然在非图案表面情况下,在蒸发过程中接触角呈现出三个不同的阶段,但在图案化硅柱阵列表面情况下,接触角却呈线性减小。在柱阵列疏水性表面的情况下,初始接触直径保持不变,直到柱上方的液滴部分完全变干。液滴的边缘收缩速度表现出非线性特性,并且在蒸发的最后阶段附近速度幅度迅速增加。

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