We present a two-axis micromirror array with high fill-factor, using a new fabrication procedure on the full wafer scale. The micromirror comprises a self-aligned vertical comb drive actuator with a mirror plate mounted on it and electrical lines on a bottom substrate. A high-aspect-ratio vertical comb drive was built using a bulk micromachining technique on a silicon-on-insulator (SOI) wafer. The thickness of the torsion spring was adjusted using multiple silicon etching steps to enhance the static angular deflection of the mirrors. To address the array, electrical lines were fabricated on a glass substrate and combined with the comb actuators using an anodic bonding process. The silicon mirror plate was fabricated together with the actuator using a wafer bonding process and segmented at the final release step. The actuator and addressing lines were hidden behind the mirror plate, resulting in a high fill-factor of 84% in an 8 × 8 array of micromirrors, each 340 μm × 340 μm. The fabricated mirror plate has a high-quality optical surface with an average surface roughness (Ra) of 4 nm and a curvature radius of 0.9 m. The static and dynamic responses of the micromirror were characterized by comparing the measured results with the calculated values. The maximum static optical deflection for the outer axis is 4.32° at 60 V, and the maximum inner axis tilting angle is 2.82° at 96 V bias. The torsion resonance frequencies along the outer and inner axes were 1.94 kHz and 0.95 kHz, respectively.
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