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首页> 外文期刊>Journal of Micromechanics and Microengineering >Surface and subsurface damages in nanoindentation tests of compound semiconductor InP
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Surface and subsurface damages in nanoindentation tests of compound semiconductor InP

机译:化合物半导体InP纳米压痕测试中的表面和亚表面损伤

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摘要

Nanoindentation tests were conducted on single-crystal indium phosphide (InP) using a Vickers indenter and a spherical indenter over a wide load range. The resulting indents were examined using scanning electron microscopy, cross-sectional transmission electron microscopy and selected area diffraction. Effects of the indenter type and indentation load on the surface cracking behavior, load-displacement characteristics and subsurface damage were investigated. The results showed that the cracking behavior and critical load for crack generation depends strongly on the indenter geometry and orientation. Pop-in events occur during loading in the case of the spherical indenter, but not in the case of the Vickers indenter. It was demonstrated that dislocations dominate the deformation mechanism, and no phase transformation occurs. The indenter contact immediately causes a high-density dislocation region, below which extend slip bands. The stress field of the indented zone was simulated by the finite element method, and the stress concentration regions corresponded to the high-density dislocation regions.
机译:使用维氏压头和球形压头在较宽的负载范围内对单晶磷化铟(InP)进行了纳米压痕测试。使用扫描电子显微镜,横截面透射电子显微镜和选择的区域衍射检查所得的凹痕。研究了压头类型和压痕载荷对表面开裂行为,载荷位移特性和地下破坏的影响。结果表明,裂纹产生的裂纹行为和临界载荷在很大程度上取决于压头的几何形状和方向。对于球形压头,在加载过程中会发生弹出事件,而对于维氏压头,则不会发生弹出事件。结果表明,位错主导变形机制,并且没有相变发生。压头接触立即导致高密度位错区域,在其下方延伸滑带。利用有限元方法对压痕区的应力场进行了模拟,应力集中区域对应于高密度位错区域。

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