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首页> 外文期刊>Journal of Microlithography, Microfabrication, and Microsystems. (JM3) >Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm
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Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm

机译:使用水作为浸没液的液体浸没光刻:取向对193 nm处的光散射的作用

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The orientation and center-of-mass contributions of water to light scattering are calculated based on the known anisotropy of the polarizability of the water molecule. Further, the polarization ratio under 90-deg scattering is calculated and the relation between orientational and center-off-mass contributions for different polarization directions is evaluated. An experiment is proposed that enables us to separate the different scattering contributions. While the amount of scattering due to molecular orientations seems to be still moderate for water, it is expected to be larger for most fluids, like fluorinated polymers.
机译:水对光散射的方向和质心贡献是基于水分子极化率的已知各向异性来计算的。此外,计算了90度散射下的偏振比,并评估了不同偏振方向的取向和中心偏心质量贡献之间的关系。提出了一个实验,使我们能够分离出不同的散射贡献。尽管由于分子取向引起的散射量对于水似乎仍然适中,但对于大多数流体(如氟化聚合物),预计会更大。

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