IR laser-induced thermolysis and UV laser-induced photolysis of 1,3-diethyldisiloxane: chemical vapour deposition of nanotextured hydridoalkylsilicones

摘要

IR laser thermolysis and UV laser photolysis of gaseous 1,3-diethyldisiloxane proceed via different mechanisms: the former involves 1,1-H-2 and ethene elimination, whereas the latter is dominated by 1,1-H-2 and ethane elimination. The difference plays an important role in determining the composition of the solid nanotextured films deposited from the gas phase. [References: 38]