首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Electrochemically deposited nanocrystalline InSb thin films and their electrical properties
【24h】

Electrochemically deposited nanocrystalline InSb thin films and their electrical properties

机译:电化学沉积纳米晶InSb薄膜及其电性能

获取原文
获取原文并翻译 | 示例
       

摘要

We present an electrochemical route to prepare nanocrystalline InSb thin films that can be transferred to an industrial scale. The morphology, composition, and crystallinity of the prepared uniform and compact thin films with a surface area of around 1 cm(2) were investigated. The essential electrical characteristics such as conductivity, Seebeck coefficient, the type, concentration and mobility of charge carriers have been examined and compared with InSb nanowires obtained in the same system for electrochemical deposition (fixed pulse sequence, temperature, electrolyte composition, and system geometry). Moreover, obtained thin films show much higher band gap energy (0.53 eV) compared to the bulk material (0.17 eV) and InSb nanowires (0.195 eV).
机译:我们提出了一种电化学途径来制备可以转移到工业规模的纳米晶InSb薄膜。研究了制备的均匀且致密的薄膜,其表面积约为1 cm(2)的形态,组成和结晶度。已经检查了基本电学特性,例如电导率,塞贝克系数,电荷载流子的类型,浓度和迁移率,并将其与在同一系统中用于电化学沉积的InSb纳米线进行了比较(固定脉冲序列,温度,电解质成分和系统几何形状) 。此外,与本体材料(0.17 eV)和InSb纳米线(0.195 eV)相比,获得的薄膜显示出更高的带隙能(0.53 eV)。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号